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Picosun Group has been recognized by MedTech Outlook Magazine as the exclusive recipient of “Top 10 Medical Device Manufacturing Solution Companies in Europe - 2019,” based on our proprietary methodology, reflecting its position in the industry. This profile has been developed by the MedTech Outlook research and editorial team based on insights from an interview with Dr. Jani Kivioja, CTO.
Dr. Jani Kivioja, CTO
Juhana Kostamo, Managing Director![]()
We provide healthcare industries with comprehensive, turn-key ALD solutions to enable novel, cutting-edge products with improved safety, lifetime, and comfort of use
Company
Picosun Group
Management
Dr. Jani Kivioja, CTO and Juhana Kostamo, Managing Director
Description
Picosun is the leading provider of advanced ALD (Atomic Layer Deposition) thin film coating technology for global industries and R&D. Picosun's production-proven ALD solutions enable high-performance IC components, smart sensors, and MEMS devices, brightest LEDs, powder materials functionalization Picosun's product portfolio ranges from fully automated,
SEMI and production line compatible batch and cluster ALD systems optimized for high volume manufacturing to smaller scale lab- or pilot production ALD tools. They enable the industry to take a leap into the future by novel, cutting-edge coating solutions
Sito Web:
mythras.it
Amministratore:
Roberto Livio Mastronardi, co-fondatore
Descrizione:
Mythras è un team di tecnici specializzati nell'assistenza tecnica su strumentazione IVD, esperti nell'aiutare i responsabili di laboratorio a garantire la precisione, l'accuratezza e la conformità dei loro strumenti. È la scelta ideale per numerosi clienti e distributori, al servizio delle loro complesse esigenze di assistenza tecnica e ricondizionamento della strumentazione IVD.
Citazione:
“Siamo certificati ISO 9001:2015 per l'assistenza tecnica e il ricondizionamento della strumentazione analitica IVD.”
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FREMONT, CA: Picosun's thin-film barrier coating technology Atomic Layer Deposition (ALD) provides a solution for reducing the use of harmful process gases, like the sulfur hexafluoride (SF6) and nitrogen trifluoride (NF3). At present, the covering methods for Chemical Vapor Deposition (CVD), relatively thick films, should be grown to get the desired level of performance to meet the required requirements.